B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.

ASML has delivered a first-generation Twinscan EXE:5000 High-NA extreme ultraviolet (EUV) lithography scanner to Intel, seven years after Intel first ordered the machine. The High numerical aperture ...

Intel recently confirmed the latest results in its partnership with ASML. The US chipmaker worked with engineers from the European corporation to install, test, and validate ...

Intel's foundry arm says it has crossed a major lithography milestone: it has announced successful acceptance testing of ASML's TWINSCAN EXE:5200B High Numerical Aperture (High-NA) EUV scanner, one of ...

Belgian R&D company Imec has reported a number of chip making breakthroughs at the joint lab it runs with EUV lithography company ASML. According to Imec, it has successfully printed circuit patterns ...

According to a report from Tom's Hardware, China's so-called "Frankenstein" EUV scanner was assembled from mismatched parts sourced through various channels, potentially including surplus equipment ...

Christophe Fouquet, President, CEO and Chair of the Board of Management, announced the reappointment of Roger Dassen and Frederic Schneider-Maunoury to the Board of Management and the appointment of ...

ASML Holding (ASML) is aiming for about 30% year-over-year growth in extreme ultraviolet (EUV) revenues in 2025. ASML expects this growth to be driven by both an increase in Low Numerical Aperture (NA ...

ASML (NASDAQ:ASML) reported third-quarter 2025 results showing slightly lower revenue but stronger-than-expected earnings, driven by robust demand for its Extreme Ultraviolet (EUV) lithography systems ...