Using an opto-mechanical architecture with a master-oscillator regenerative-ring amplifier, the 193-nm LithoTEX excimer laser for lithography scanning delivers a power output of 50 W with a pulse ...

Japanese firm Nuvoton Technology has started mass production of its high-power UV semiconductor laser (379 nm, 1.0 W), which delivers industry-leading optical output in a 9.0 mm diameter CAN package ...

Nuvoton Technology Corporation Japan (hereinafter "NTCJ") announced on January 20 the start of mass production of its ...

Nano-3D printing market leader Nanoscribe has opened its Shanghai Quantum X demolab, bringing next-generation 3D ...

Heidelberg, Germany—Heidelberg Instruments, a world-leading provider of advanced laser lithography systems, is pleased to announce a continued stream of orders for the ULTRA Semiconductor Mask Writer ...

Design of the laser speckle exposure system. Schematic representation of the laser speckle exposure system, comprising the UV laser, shutter, beam expander, mirror, convex lens, engineering diffuser, ...

Zurich, Switzerland — Following the successful introduction of the modular NanoFrazor nanolithography system in 2024, Heidelberg Instruments is proud to announce the installation of the newest ...

(Nanowerk News) Silicon, the cornerstone of modern electronics, photovoltaics, and photonics, has traditionally been limited to surface-level nanofabrication due to the challenges posed by existing ...

The most comprehensive sci-tech news coverage on the web ...

Multiphoton lithography (often called multiphoton 3D lithography) is an additive manufacturing approach for fabricating intricate micro- and nanostructures. It relies on nonlinear optical absorption, ...